Focused Ion Beam / Scanning Electron Microscope


Focused Ion Beam SEM

The FIB emits a collimated beam of gallium ions which are used to "ion mill" a surface. The resolution of the ion gun is 10.0 nm at 30 kV. Rastering of the beam allows complex topographies to be created in virtually any material. Our instrument includes the Omniprobe 100.7 nanomanipulator, and AutoFIB and AutoTEM software for efficient generation of cross sectional TEM samples. The Omniprobe is a precision chamber mounted nano-manipulator that enables accurate in-situ lift out and nano-assembly of samples. The system is also equipped with a platinum deposition source. The combination of FIB, omniprobe, and a platinum source allows for unprecedented nano-fabrication capabilities including the ability to prepare samples for Transmission Electron Microscopy analysis.

In addition the system is equipped with an ESEM column equipped with a tungsten filament for imaging from low to high vacuum levels. The secondary electron (SE) detector has a resolution of 3.5 nm at 30 kV at high vacuum and <15 nm at 3 kV in a low vacuum. The INCA Synergy 350 with HKL Premium EBSD System allows elemental analysis, including the generation of phase maps from elemental maps and Cameo data. The ESEM is therefore capable of imaging and elemental analysis and mapping of large samples up to 12 inches in diameter.

In addition, the system is equipped with an HKL Premium Electron BackScatter Detector which allows capture and analysis of electron backscatter patterns (EBSP) from crystalline samples. This allows the creation of orientation maps of microstructures, generation of combined orientation and elemental maps, and pole figures.

Instrument Location

Focused Ion Beam / Scanning Electron Microscope User Rates

Scheduling and Contact

To schedule time on this instrument or to learn more about its capabilities and user fees, etc. please contact:

Ying-Bing Jiang
Research Scientist, Chemical & Nuclear Engineering